Thermal Stability of Nickel Silicide Films
- 1 January 1996
- journal article
- Published by Springer Nature in MRS Proceedings
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Analysis of resistance behavior in Ti- and Ni-salicided polysilicon filmsIEEE Transactions on Electron Devices, 1994
- A Titanium Salicide Process Suitable for Submicron CMOS ApplicationsMRS Proceedings, 1993
- Comparison of transformation to low-resistivity phase and agglomeration of TiSi/sub 2/ and CoSi/sub 2/IEEE Transactions on Electron Devices, 1991