Reproducibility of Properties of SnOx Thin Films Prepared by Reactive Sputtering
Open Access
- 18 October 1983
- journal article
- research article
- Published by Wiley in Active and Passive Electronic Components
- Vol. 11 (4) , 271-280
- https://doi.org/10.1155/apec.11.271
Abstract
The preparation of tin dioxide films by low energy reactive sputtering of tin and tin‐antimony (1‐10% wt. Sb) in an oxygen – argon atmosphere is described. The dependences of oxygen content in the range from 0 to 50%, target compositions, substrate temperature of 300 K‐573 K on minimum resistivity at satisfactory transmittance and on reproducibility are discussed. The correlation between the electrical and optical properties and the microstructure of the films is shown.Keywords
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