Computers help in the war against dust
- 1 September 1996
- journal article
- other
- Published by IOP Publishing in Physics World
- Vol. 9 (9) , 25-26
- https://doi.org/10.1088/2058-7058/9/9/19
Abstract
Dust is one of the main problems for the semiconductor industry. If small particles are present in the plasmas commonly used to etch microelectronic circuits, they can become trapped on the silicon wafer's surface. This can degrade the device's performance and "kill" it if the dust particles are large enough.Keywords
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