Josephson Tunnel-Junction Electrode Materials
- 23 May 1980
- journal article
- research article
- Published by American Association for the Advancement of Science (AAAS) in Science
- Vol. 208 (4446) , 944-950
- https://doi.org/10.1126/science.208.4446.944
Abstract
Josephson superconducting devices of the tunnel-junction type have exciting potential for use in building ultrahigh-speed computers. We consider the properties of superconducting metals that are needed for such devices that would be used in integrated computer circuits operated at a temperature near absolute zero. Recent advances in lead-alloy thin-film materials are described that have led to substantial improvements in lead-alloy Josephson device reliability. The properties of a Pb0.84In0.12Au0.04 alloy, of Nb, and of Nb3Sn are discussed as examples of three different groups of materials that are of interest. Investigations of lead-alloy and niobium devices have progressed to the point that it is evident that they have good potential for fabricating integrated circuits containing large numbers of devices.Keywords
This publication has 18 references indexed in Scilit:
- Energy gaps of the superconductors Sn, Si, and Ge measured by tunnelingPhysical Review B, 1979
- Experimental single flux quantum NDRO Josephson memory cellIEEE Journal of Solid-State Circuits, 1979
- Thermal strain in thin lead films III: Dependences of the strain on film thickness and on grain sizeThin Solid Films, 1979
- Strain relaxation in Pb-alloy Josephson junction electrode materialsIEEE Transactions on Magnetics, 1979
- Fabrication and barrier diagnostics of superconductive tunnel junctions on Nb-Sn and V-SiIEEE Transactions on Magnetics, 1979
- Josephson properties of Nb3Sn/Pb tunnel junctionsApplied Physics Letters, 1978
- Residual strains of Pb thin films deposited onto Si substratesActa Metallurgica, 1978
- Josephson tunneling logic gates with thin electrodesIEEE Transactions on Magnetics, 1977
- Metallurgical considerations with respect to electrodes and interconnection lines for Josephson tunneling circuitsJournal of Vacuum Science and Technology, 1976
- Stress Relief and Hillock Formation in Thin Lead FilmsJournal of Applied Physics, 1970