Characterization of interface defects in GaAs-GaAlAs superlattices

Abstract
Capacitance transients in a 20‐20 Å GaAs‐Ga0.7 Al0.3As n‐type (3×1016 cm3) Si‐doped superlattice have been performed. In the temperature range 50–100 K, a logarithmic time decay is observed. We attribute this time decay to the existence of a continuum of deep levels in the fundamental gap of the superlattice, related to electron traps located at the GaAs‐GaAlAs interfaces.

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