Superconducting Niobium Films by Vacuum Deposition
- 1 December 1963
- journal article
- conference paper
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 34 (12) , 3538-3540
- https://doi.org/10.1063/1.1729253
Abstract
Niobium films 300 to 150 000 Å thick were formed by vacuum deposition using electron bombardment techniques. The films were superconducting at 4.2°K in magnetic fields as high as 30 kOe. Critical current density at 4.2°K is in the order of 106 A/cm2. The superconducting transition temperature, 9.3°K for a 2300‐Å thick film, is less for thinner films. Aging effects were noted for the high‐field current‐carrying capacity.This publication has 9 references indexed in Scilit:
- Niobium-Thorium Eutectic Alloy as a High-Field, High-Current SuperconductorJournal of Applied Physics, 1963
- High-Field Superconductivity in NiobiumPhysical Review Letters, 1962
- Negative Surface Free-Energy Effects in Superconducting NiobiumPhysical Review Letters, 1962
- Effect of Plastic Deformation and Annealing Temperature on Superconducting PropertiesPhysical Review B, 1962
- The Magnetic Behavior of Superconductors of Negative Surface EnergyIBM Journal of Research and Development, 1962
- Superconducting magnetsCryogenics, 1961
- Irreversibility in the Superconducting Transition of LeadPhysical Review B, 1960
- Hall Effect, Resistivity, and Magnetoresistivity of Th, U, Zr, Ti, and NbPhysical Review B, 1959
- The Vapor Pressure of Metallic TungstenPhysical Review B, 1913