METASTABLE DECAY AND COLLISIONS OF SPUTTERED METAL AND SILICON CLUSTER IONS

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Abstract
Cluster ions and anions are produced by rare gas ion bombardment of surfaces. A rough correlation between sputtering yield Y and maximum number of atoms in the cluster n is found. Kinetic energy spreads decrease with n, generally being larger than those of ionized neutrals. Strong unimolecular decay leads to intensity anomalies in cluster mass spectra. Decay rate constants are strongly time dependent and reveal differences in cluster binding energies. Fragment patterns resulting from keV cluster collisions in a rare gas target turn out to be strongly related to the decay rates

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