Dry oxidation
- 1 January 1987
- journal article
- Published by Taylor & Francis in Philosophical Magazine Part B
- Vol. 55 (2) , 211-224
- https://doi.org/10.1080/13642818708211204
Abstract
No abstract availableKeywords
This publication has 8 references indexed in Scilit:
- Transport processes during the growth of oxide films at elevated temperatureReviews of Modern Physics, 1985
- AN OVERVIEW OF THE KINETICS OF OXIDATION OF SILICON: THE VERY THIN SIO2 FILM GROWTH REGIMEPublished by Elsevier ,1983
- Mechanisms for the oxidation of silicon and the formation of charged defectsProceedings of the Royal Society of London. Series A. Mathematical and Physical Sciences, 1981
- On SiOH and SiH Groups in SiO2 Films on SiliconJournal of the Electrochemical Society, 1977
- Electron states in-quartz: A self-consistent pseudopotential calculationPhysical Review B, 1977
- Oxidation of silicon by water and oxygen and diffusion in fused silicaThe Journal of Physical Chemistry, 1976
- General Relationship for the Thermal Oxidation of SiliconJournal of Applied Physics, 1965
- Effect of an Electric Field on Silicon OxidationThe Journal of Chemical Physics, 1962