Influence of aberration on performance during use of resolution enhancement technology

Publisher Website
Google Scholar
Abstract
We have investigated the influence of a spherical aberration on the printing characteristics with modified illumination. At first, we have developed a simple method for measuring the aberration function with an alternating phase shift mask (PSM), and have measured that in the projection optics of a commercially available KrF stepper. Then the anomalous phenomena observed in the printing with modified illumination are examined with the simulated aerial images with the measured spherical aberration. As a result, we found good coincidence between the simulated images and the anomalies. In conclusion, the origin of the anomalies is ascribed to the spherical aberration in the projection optics.

This publication has 0 references indexed in Scilit: