Organometallic precursors in the growth of epitaxial thin films of III-V semiconductors by metal-organic chemical vapor deposition (MOCVD)
- 1 March 1991
- journal article
- Published by American Chemical Society (ACS) in Chemistry of Materials
- Vol. 3 (2) , 225-242
- https://doi.org/10.1021/cm00014a008
Abstract
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