Real-time optical diagnostics for epitaxial growth

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Abstract
Various optical techniques have been developed over the last few years for real-time analysis of surfaces and near-surface regions of semiconductor epitaxy. These techniques are providing insights into microscopic mechanisms of epitaxy and opportunities for sample-driven closed- loop feedback control of the epitaxial growth process. Both aspects are expected to become increasingly important as device complexity increases and tolerances become more stringent. Examples are provided and opportunities discussed.

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