The orientation dependent diffusion of boron in silicon under oxidizing conditions
- 28 February 1969
- journal article
- research article
- Published by Elsevier in Solid-State Electronics
- Vol. 12 (2) , 133-134
- https://doi.org/10.1016/0038-1101(69)90122-1
Abstract
No abstract availableThis publication has 1 reference indexed in Scilit:
- Diffusion of Boron into SiliconJournal of Applied Physics, 1960