Gas-to-Particle Conversion Mechanism in Chemical Vapor Deposition of Silicon Carbide by SiH4and C2H2
- 1 September 1998
- journal article
- Published by American Chemical Society (ACS) in Industrial & Engineering Chemistry Research
- Vol. 37 (9) , 3602-3609
- https://doi.org/10.1021/ie9801812
Abstract
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