Nonlinear control of rapid thermal chemical vapor deposition under uncertainty
- 1 June 1999
- journal article
- Published by Elsevier in Computers & Chemical Engineering
- Vol. 23, S241-S244
- https://doi.org/10.1016/s0098-1354(99)80059-3
Abstract
No abstract availableKeywords
This publication has 1 reference indexed in Scilit:
- Model reduction for optimization of rapid thermal chemical vapor deposition systemsIEEE Transactions on Semiconductor Manufacturing, 1998