Mini-Lasers For High-Repetition-Rate Rare Gas Halide Oscillators

Abstract
We report operation of a rare gas halide mini laser with an active area 10 cm x 2 mm x 4 mm and complete dimension including blumlein circuit slightly over one square foot. KrF lasing of greater than 320 milliwatts average power at 333 Hz is reported and steady lasing at over 1.25 kHz is obtained. The energy per pulse at low repetition rate is 1.8 mJ. XeCl lasing of greater than 60 milliwatts average power at 350 Hz is reported, and steady lasing at over 850 Hz is obtained. Pulsewidth control is obtained from 10 ns to over 50 ns via control of the cavity Q.

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