Near-field direct-write ultraviolet lithography and shear force microscopic studies of the lithographic process
- 25 December 1995
- journal article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 67 (26) , 3859-3861
- https://doi.org/10.1063/1.115297
Abstract
Direct‐write lithography on a 100 nm scale has been carried out using the near‐field optical interaction between an uncoated tapered fiber tip and a layer of photoresist. This allows both lithography and shear force microscopic examination of the surface, which reveals morphological changes in the photoresist before development.This publication has 0 references indexed in Scilit: