Gate-controlled Hg1−xCdxTe photodiodes passivated with native sulfides

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Abstract
The properties of ion-implanted junctions in Hg1−xCdxTe with x=0.22, passivated by a novel native sulfide technique, are described. The junctions are typically operated at 77 K, with 50% responsivity at a wavelength of 10.5 μm. To study the effects of the passivated surface on the diode properties, special gate-controlled diodes were processed, including both nickel and titanium gate metals. In addition, a novel enhancement mode metal–insulator–semiconductor field-effect transistor (MISFET) is presented. The measured dc properties and noise current spectral densities of various diodes as a function of reverse bias and gate control voltage show that close to background limited devices may be realized with the above surface passivation. In particular, such diodes exhibit good 1/f noise performance at low frequency, with reverse bias of close to 200 mV, without requiring a special gate electrode.

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