Optical coatings for UV photolithography systems
- 19 August 1996
- proceedings article
- Published by SPIE-Intl Soc Optical Eng
- Vol. 2776, 353-366
- https://doi.org/10.1117/12.246823
Abstract
The performance of UV photolithography lens-systems with usually several ten optical components is limited by both the quality of the substrates and by the quality of the optical coatings. The key problems are the quality of the reflectance over large and strongly curved surfaces, the absorption and scatter losses and the behavior during heavy UV irradiation in production lines.Keywords
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