Furnace and Rapid Thermal Annealing of P+/n Junctions in BF 2 + ‐ Implanted Silicon
- 1 October 1985
- journal article
- Published by The Electrochemical Society in Journal of the Electrochemical Society
- Vol. 132 (10) , 2473-2475
- https://doi.org/10.1149/1.2113602
Abstract
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