Plasma-assisted chemical vapour deposition of diamond by hollow cathode arc discharge
- 1 October 1992
- journal article
- research article
- Published by Elsevier in Thin Solid Films
- Vol. 219 (1) , 4-6
- https://doi.org/10.1016/0040-6090(92)90716-o
Abstract
No abstract availableKeywords
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