Electrical Properties and Solid-Phase Reactions in Ni/Si(100) Contacts
- 30 April 2002
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 41 (Part 1, No) , 2450-2454
- https://doi.org/10.1143/jjap.41.2450
Abstract
The solid-phase reaction and electrical characteristic in Ni/Si contact systems have been investigated. We show that nickel monosilicide (NiSi) is an attractive candidate for contact materials in terms of its flat interface morphology, low sheet resistance, and low formation temperature. The contact resistivities on the order of 10-8 Ωcm2 are obtained in both n- and p-types contacts formed at 350°C.Keywords
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