The chemomechanical polishing of the “A” or cadmium‐rich face of cadmium sulfide has been accomplished. The etchant contained 90 mliters nitric acid, 300 mliters precipitated silica, and 10g aluminum chloride per 1000 mliters water. Best results were obtained using a poromeric polishing disk with 370 g/cm2 work pressure at 240 rpm polishing wheel speed. Surfaces were completely featureless when viewed by Nomarski and Michelson interference microscopy at 155 and 400X, and gave good LEED patterns after brief heat‐cleaning under vacuum.