Properties of carbon coating films produced by electron cyclotron resonance plasmas

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Abstract
For carbon coating films produced by electron cyclotron resonance (ECR) plasma in ECR-2 (RIKEN), the depth composition profiles were analyzed by Auger electron spectroscopy (AES). In the AES analysis, the sputter-etching rate was two or more times lower than that produced by a radio frequency (rf) assisted glow discharge plasma in the TEXTOR tokamak. This result indicates that a hard or dense carbon film was produced by the ECR plasma. The hydrogen concentration of the film was determined by thermal desorption spectroscopy. The hydrogen content was approximately (20%–30%). The carbon films produced by the ECR plasma with different operation parameters were examined. The hydrogen concentration is increased when the gas pressure is increased. For the substrate biased negatively, impurities from the substrate were observed in the film. When the substrate was heated, no carbon film was formed.

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