Temperature dependence of UV-induced compaction in fused silica
- 7 July 1997
- proceedings article
- Published by SPIE-Intl Soc Optical Eng
- Vol. 3051, 907-912
- https://doi.org/10.1117/12.276046
Abstract
Different 1995 - 1996 grade experimental fused silica samples were evaluated for their resistance to UV-induced compaction at 193 nm under elevated sample temperature conditions. Stress induced birefringence was used as a sensitive compaction monitor. We found that compaction rate decreases with increasing sample temperature. Isochronal annealing experiments were performed on two different sets of pre-damaged fused silica samples. Annealing of compaction was observed at temperatures as low as 200 degree(s)C, and an activation energy of 0.1 eV was found.Keywords
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