The role of sputtering and displacement damage in the electron SCRIBE process
- 1 September 1991
- journal article
- research article
- Published by Taylor & Francis in Philosophical Magazine Letters
- Vol. 64 (3) , 133-141
- https://doi.org/10.1080/09500839108214679
Abstract
A calculation of the surface erosion and vacancy injection that is produced in thin-foil specimens under high-energy electron irradiation is described. Two distinct types of damage behaviour can be predicted which depend upon the relative magnitudes of the sputtering and vacancy-enhanced displacement cross-sections. When sputtering dominates, uniform thinning from the electron exit side of the foil is predicted, but when vacancy-enhanced displacement dominates, vacancy injection is predicted.Keywords
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