Nucleation and growth of carbon nanotubes by microwave plasma chemical vapor deposition
Top Cited Papers
- 16 October 2000
- journal article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 77 (17) , 2767-2769
- https://doi.org/10.1063/1.1319529
Abstract
The nucleation and growth of aligned multiwall carbon nanotubes by microwave plasma-enhanced chemical vapor deposition have been studied. The nanotubes nucleate and grow from catalytic cobalt islands on a silicon substrate surface, with both their diameter and length dependent on the size of the cobalt islands. Electron microscopy reveals that the nanotubes grow via a “base growth” mechanism. The nanotubes grow initially at a very rapid and constant rate (∼100 nm/s) that decreases sharply after the catalyst Co particles become fully encapsulated by the nanotubes. We propose a detailed model to explain these experimental observations on nucleation and growth of nanotubes.Keywords
This publication has 8 references indexed in Scilit:
- Why are carbon filaments tubular?Published by Elsevier ,2002
- Plasma-induced alignment of carbon nanotubesApplied Physics Letters, 2000
- Electronic Structures of Single-Walled Carbon Nanotubes Determined by NMRScience, 2000
- Highly-ordered carbon nanotube arrays for electronics applicationsApplied Physics Letters, 1999
- Self-Oriented Regular Arrays of Carbon Nanotubes and Their Field Emission PropertiesScience, 1999
- Synthesis of Large Arrays of Well-Aligned Carbon Nanotubes on GlassScience, 1998
- Large-Scale Synthesis of Aligned Carbon NanotubesScience, 1996
- Crystalline Ropes of Metallic Carbon NanotubesScience, 1996