The effect of collector biasing on current distribution in the DC diode sputtering discharge
- 1 April 1974
- journal article
- Published by IOP Publishing in Journal of Physics E: Scientific Instruments
- Vol. 7 (4) , 261-266
- https://doi.org/10.1088/0022-3735/7/4/014
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- Influence of Surface Absorption Characteristics on Reactively Sputtered Films Grown in the Biased and Unbiased ModesJournal of Applied Physics, 1972
- Control of Film Properties by rf-Sputtering TechniquesJournal of Vacuum Science and Technology, 1971
- Sputtering of Chemisorbed Nitrogen with Ar+Journal of Vacuum Science and Technology, 1971
- Distribution of Material Sputtered from a Disk ElectrodeJournal of Vacuum Science and Technology, 1969