Performance of low-resistance microchannel-plate stacks

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Abstract
Results are presented from an evaluation of three sets of low resistance microchannel plate (MCP) stacks; the tests encompassed gain, pulse-height distribution, background rate, event rate capacity as a function of illuminated area, and performance changes due to high temperature bakeout and high flux UV scrub. The MCPs are found to heat up, requiring from minutes to hours to reach stabilization. The event rate is strongly dependent on the size of the area being illuminated, with larger areas experiencing a gain drop onset at lower rates than smaller areas.

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