Growth of diamond films at low pressure using magneto-microwave plasma CVD
- 1 January 1990
- journal article
- Published by Elsevier in Journal of Crystal Growth
- Vol. 99 (1-4) , 1201-1205
- https://doi.org/10.1016/s0022-0248(08)80108-x
Abstract
No abstract availableKeywords
This publication has 11 references indexed in Scilit:
- The Synthesis of Diamond Films at Lower Pressure and Lower Temperature Using Magneto-Microwave Plasma CVDJapanese Journal of Applied Physics, 1989
- Diamond synthesis from methane-hydrogen-water mixed gas using a microwave plasmaJournal of Materials Science, 1988
- Synthesis of diamond films in a rf induction thermal plasmaApplied Physics Letters, 1987
- Large Area Chemical Vapour Deposition of Diamond Particles and Films Using Magneto-Microwave PlasmaJapanese Journal of Applied Physics, 1987
- Growth of diamond thin films by dc plasma chemical vapor depositionApplied Physics Letters, 1987
- Synthesis of Diamond Thin Films by Thermal CVD Using Organic CompoundsJapanese Journal of Applied Physics, 1986
- Growth of diamond thin films by electron assisted chemical vapor depositionApplied Physics Letters, 1985
- Diamond synthesis from gas phase in microwave plasmaJournal of Crystal Growth, 1983
- Growth of diamond particles from methane-hydrogen gasJournal of Materials Science, 1982
- Vapor Deposition of Diamond Particles from MethaneJapanese Journal of Applied Physics, 1982