Ion currents and energies in reactive low-voltage ion plating: preliminary results

1 December 1990

proceedings article
Published by SPIE-Intl Soc Optical Eng

Vol. 1323, 19-28
https://doi.org/10.1117/12.22369

Abstract

Reactive Low-Voltage Ion Plating (RLVIP) is a plasma-assisted evaporation process that produces anorganic oxide- and nitride films with a closed microstructure. in order to better understand the process and the resulting film properties a BALZERS PPM 400 Plasmamonitor, a combination of a quadrupole mass filter and an energy selective ion optics, has been used to study the relative abundancies and energy distributions of the ions impinging on the growing film in the RLVIP process. The device is discussed and preliminary results are presented: The plasma is anisotropic. Surprisingly it contains ions with higher energies than expected from the self-bias potential.© (1990) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.

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