Preparation of Thick Silica Films by Combined Sol-Gel and Electrophoretic Deposition Methods

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Abstract
Homogeneous, thick silica films composed of fine particles were prepared in a short time by using an electrophoretic deposition technique combined with the sol-gel method. Electrophoretic deposition was carried out using the silica sols derived from tetraethoxysilane hydrolyzed with water of a variety of pH; EtOH, i-PrOH, and n-PrOH were used as a solvent. In the case of pH=11.7 and a solvent of EtOH, the maximum coating weight was attained at an applied voltage of 140V and the thickness of the film was about 17μm. The surface of this coating film was found to be homogeneous and smooth by SEM observation. The coating weight was roughly proportional to the charge density with nearly the same slope independent of the kind of solvents.

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