Comparison of advanced plasma sources for etching applications. IV. Plasma induced damage in a helicon and a multipole electron cyclotron resonance source
- 1 May 1994
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
- Vol. 12 (3) , 1340-1350
- https://doi.org/10.1116/1.587297
Abstract
No abstract availableKeywords
This publication has 0 references indexed in Scilit: