High aspect ratio micromachining Teflon by direct exposure to synchrotron radiation
- 7 August 1995
- journal article
- research article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 67 (6) , 872-874
- https://doi.org/10.1063/1.115533
Abstract
Micromachining Teflon was achieved by direct exposure to synchrotron radiation and the microstructures made had the smallest surface detail down to 20 μm with structural height of more than 200 μm, that is, aspect ratio on the order of 10. The quality of micromachining Teflon by this process was found to be critically dependent on photon flux of the synchrotron radiation. Analysis of the mass distribution of gaseous species formed upon this process suggested that photochemical processes rather than pyrolytic processes may still dominate.Keywords
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