Lattice recovery of oxygen-implanted YBa2Cu3O7−δ superconductor

Abstract
The regrowth of an oxygen‐implanted YBa2Cu3O7−δ thin film was studied by Rutherford backscattering, ion channeling, and x‐ray diffraction studies. The atomic composition of the thin film was preserved even after a 1 h anneal at 990 °C, reflecting the high chemical stability of the material obtained by the pulsed laser deposition technique. Two distinct activation energies were determined during the regrowth process: 0.42±0.04 eV at lower temperatures, corresponding to epitaxial growth from the interface, and 0.18±0.03 eV at higher temperatures, presumably associated with homogeneous nucleation and reorientation.

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