Copolymer Approach to Design of Sensitive Deep-UV Resist Systems with High Thermal Stability and Dry Etch Resistance

Publisher Website

31 October 1989

book chapter
Published by American Chemical Society (ACS)

p. 57-73
https://doi.org/10.1021/bk-1989-0412.ch004

Abstract

No abstract available

Keywords

This publication has 0 references indexed in Scilit: