Equipment for in-situ X-ray diffraction and resistance measurements during ion implantation at temperatures between 4 and 1270 K
- 1 October 1996
- journal article
- Published by Elsevier in Surface and Coatings Technology
- Vol. 84 (1-3) , 563-566
- https://doi.org/10.1016/s0257-8972(95)02743-2
Abstract
No abstract availableKeywords
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