Generation of Radiation Pressure in Thermally Induced Ultrasonic Emitter Based on Nanocrystalline Silicon

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Abstract
To confirm the applicability of thermally induced ultrasonic emission from nanocrystalline silicon (nc-Si) devices as radiation pressure generators, the dynamic response has been investigated under a pulse operation mode. The nc-Si emitter is fabricated on a p-type Si wafer by conventional electrochemical anodization with subsequent formation of the surface electrode. Due to the flat nature of the frequency response of this emitter, the device emits an acoustic wave with little distortion under the pulse-drive condition. It is shown that a significant radiation pressure of 34.5 Pa is generated by a concentrated burst-like electrical input, and that a beam located at a distance can be levitated as a result of the mechanical loading effect. This silicon-based emitter is attractive for applications to integrated nano- or micro-electromechanical systems.