A comparison of projection and proximity printings —from UV to x-ray
- 30 April 1990
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 11 (1-4) , 137-145
- https://doi.org/10.1016/0167-9317(90)90089-c
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
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- A critical examination of submicron optical lithography using simulated projection imagesJournal of Vacuum Science & Technology B, 1983
- Computer simulation study of images in contact and near‐contact printingPolymer Engineering & Science, 1974
- On the diffraction theory of optical imagesProceedings of the Royal Society of London. Series A. Mathematical and Physical Sciences, 1953