Surface electromigration of metal atoms on Si(111) surfaces studied by UHV reflection electron microscopy
- 2 May 1989
- journal article
- Published by Elsevier in Ultramicroscopy
- Vol. 29 (1-4) , 161-167
- https://doi.org/10.1016/0304-3991(89)90242-8
Abstract
No abstract availableFunding Information
- Ministry of Education (62609511, 62609514)
This publication has 6 references indexed in Scilit:
- Electromigration of Ag Ultrathin Films on Si(111) 7×7Japanese Journal of Applied Physics, 1988
- Reflection electron microscopyJournal of Applied Crystallography, 1987
- Electromigration of In Ultrathin Film on Si(111)Japanese Journal of Applied Physics, 1986
- Field-induced surface transport of indium adatoms on Si(111) surfacesThin Solid Films, 1982
- In situreflection electron microscope study of metal deposition on clean Si(111) surfaceActa Crystallographica Section A Foundations of Crystallography, 1981
- Reflection electron microscopy of clean and gold deposited (111) silicon surfacesSurface Science, 1980