The Role of U.V. Light in the Inhibition of Electroless Deposition

1 January 1972

journal article
Published by The Electrochemical Society in Journal of the Electrochemical Society

Vol. 119 (8) , 1013-1016
https://doi.org/10.1149/1.2404384

Abstract

Ultraviolet light has been shown to be effective in inhibiting the electroless deposition of Cu, Ni, and Co if applied after sensitization, and of Ni and Co after activation. Electron microscopic techniques are applied to investigate these phenomena. It is concluded that structural changes in the sensitizing and activating agents induced by the u.v. light are connected with the inhibition of metal deposition.

Keywords

ELECTROLESS DEPOSITION
STRUCTURAL CHANGES
MICROSCOPIC TECHNIQUES
U.V
ACTIVATING AGENTS
AGENTS INDUCED
DEPOSITION ULTRAVIOLET

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