Study of hydrogen incorporation in MOS-structures after various process steps using nuclear reaction analysis (NRA)
- 31 August 1993
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 22 (1-4) , 65-68
- https://doi.org/10.1016/0167-9317(93)90131-n
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- A quantitative investigation of hydrogen in the metal-oxide-silicon system using NRAIEEE Transactions on Nuclear Science, 1990
- Measurements of the accumulation of hydrogen at the silicon-silicon-dioxide interface using nuclear reaction analysisNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1990
- Measurements of hydrogen in metal-oxide-semiconductor structures using nuclear reaction profilingJournal of Applied Physics, 1988
- 15N hydrogen profiling: Scientific applicationsNuclear Instruments and Methods, 1978