Abstract
A method for the deposition of lanthanum oxide and rare-earth (Re) oxide films using the tris[2,2,6,6-tetramethyl-3,5-heptanedionato] chelate complexes is reported. The films were characterized by metal analysis, carbon analysis, FTIR spectra, XPS and SEM micrographs. The film composition strongly depends on experimental parameters. Films deposited in an oxygen plasma at a substrate temperature of 400°C and a power density of 1.5 W/cm 2 are amorphous, transparent and show carbon contents of < 2%. If argon or hydrogen is used as carrier gas, films contain ≈ 5% carbon. With substrate temperatures < 400° C or power densities < 1.5 W/cm 2, films containing trivalent Re metal ions and considerable contamination by polymeric material are formed.

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