Cyclic acetal‐photosensitized polymerization. I. Photopolymerization of styrene in the presence of 1,3‐dioxolanes

Abstract
Styrene(St) was polymerized in benzene solution in the presence of substituted 1,3‐dioxolane(DO) compounds by means of photoirradiation of the system at 40°C. The subtraction of the square of the polymerization rate in the absence of DO compounds (Rpab) from the square of the rate in the presence of DO compounds (Rppr) was found to follow the equation: The effect of substituents in the 2‐position on the polymerization rate increased in the order of methyl < hydrogen < ethyl < n‐propyl < phenyl, as shown by the rate constant kd′ of decomposition of DO compounds.

This publication has 12 references indexed in Scilit: