Improved ion beam deposition system with RF sputter-type ion source
- 1 January 1997
- journal article
- Published by Elsevier in Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
- Vol. 121 (1-4) , 102-106
- https://doi.org/10.1016/s0168-583x(96)00585-x
Abstract
No abstract availableKeywords
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- Formation of iron film by ion beam depositionSurface and Coatings Technology, 1994
- Superior Corrosion Resistance of Ion Beam Deposited Iron FilmJapanese Journal of Applied Physics, 1993
- Sputter Type HF Ion Source for Ion Beam Deposition ApparatusJapanese Journal of Applied Physics, 1987