Modification of vapor-deposited WO3 electrochromic films by oxygen backfilling

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Abstract
The effects of oxygen backfilling during WO3 vapor deposition have been studied. Rutherford backscattering and secondary ion mass spectrometry were used to show that the O/W ratio and alkali/W ratio were increased by oxygen backfilling. The durability of the deposited films in H2SO4 was shown to be limited by two mechanisms—a general uniform film dissolution and an interfacial attack resulting in delamination. The amount of degradation was reduced as the O/W ratio increased. the electrochromic coloration speed remained unchanged, the bleaching speed and self-erasure rates were faster, and the maximum optical density was lowered for oxygen-enriched films. The mechanisms by which these modifications were achieved are discussed.

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