Improving stamps for 10 nm level wafer scale nanoimprint lithography
Top Cited Papers
- 1 July 2002
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 61-62, 441-448
- https://doi.org/10.1016/s0167-9317(02)00464-1
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Nanoimprint lithography at the 6 in. wafer scaleJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 2000
- Sub-10 nm imprint lithography and applicationsJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1997
- Properties of thin anti-adhesive films used for the replication of microstructures in polymersMicroelectronic Engineering, 1997