Texture and morphology of sputtered Cr thin films

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Abstract
The crystal texture and microstructure of sputtered Cr thin films deposited on various substrates using a dc magnetron were investigated. The characterization of Cr films was carried out by an x-ray technique for texture, scanning electron microscopy and transmission electron microscopy for structure and morphology, and scanning Auger microprobe for chemical distribution of sputtered films. The sputtered Cr thin films were found to have very strong [110] preferred orientation which was independent of the substrate. Very straight columnar structures were observed with domed tops which increased in width with deposition thickness. The columnar width near the surface was found to range from 300 to 2000 Å. The crystal grain size also increased with film thickness. The correlation between the physical and crystal structure and the texture development is discussed.

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