Resist contrast enhancement in high resolution electron beam lithography

• 1 November 1989
• journal article
• Published by American Vacuum Society in Journal of Vacuum Science & Technology B
• Vol. 7  (6) , 1771-1777
• https://doi.org/10.1116/1.584455

Abstract

Keywords

• HIGH RESOLUTION
• BEAM LITHOGRAPHY
• RESOLUTION ELECTRON
• RESIST CONTRAST ENHANCEMENT