Micropattern of Inorganic Film Prepared by UV-Irradiation and Heat Treatment of Polyalkylsilyne Film
- 1 April 1995
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 34 (4A) , L452
- https://doi.org/10.1143/jjap.34.l452
Abstract
A micropattern of inorganic thin film was formed by heat treatment of a polyalkylsilyne film at 300° C after UV irradiation with photomask. The Si-Si chain of spin-coated polyalkylsilyne film was photooxidized by UV irradiation with photomask in air. The XPS spectra showed that the Si-O-Si chain of the UV-irradiated part changed into SiO2 upon heat treatment in vacuo. On the other hand, the heat treatment changed the masked part into an a-Si-like structure with low optical band gap. The micrograph demonstrated lines of the irradiated area and spaces of the masked area.Keywords
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