TEOS-based PECVD of silicon dioxide for VLSI applications

• 1 March 1996
• journal article
• research article
• Published by Wiley in Advanced Materials for Optics and Electronics
• Vol. 6  (2) , 73-82
• https://doi.org/10.1002/(sici)1099-0712(199603)6:2<73::aid-amo215>3.0.co;2-r

Abstract

Keywords

• TEOS
• SILICON DIOXIDE
• PECVD
• MICROWAVE PLASMA
• THIN FILMS